Improved Performance

The AXIS Supra⁺ is set apart from any other spectrometer by complete automation through computer control of sample handling and instrument parameters.  Unattended sample holder transfer and exchange during analysis is achieved through coordination of the Flexi-lock sample magazine and sample analysis chamber autostage. 

ESCApe integrated acquisition and processing software allows the AXIS Supra⁺ to perform to its maximum capability and provides an easy interface with the spectrometer.  

Capabilities of the AXIS Supra⁺

Large area, high sensitivity XPS

The AXIS Supra⁺ is optimised for chemical state X-ray photoelectron spectroscopy.  Efficient collection of photoelectrons combined with high transmission electron optics ensures unrivalled sensitivity and resolution at large analysis areas.  As well as conventional scanned acquisition, spectra may be acquired in fast, unscanned snap-shot mode in less than a second making use of the 128 channel Delay-Line Detector (DLD).

Key capabilities include:

• Easy detection of light elements
• Excellent signal-to-noise, even at low concentrations
• Fast data acquisition
• Scanned or snap-shot spectral acquisition modes.

High energy resolution

The fundamental requirement of any spectrometer is the best possible energy resolution.  High energy resolution, where the spectrometer does not contribute to the broadening of the photoemission peaks, is critical for the accurate measurement of small chemical shifts.  The AXIS Supra⁺ has a large 500 mm Rowland circle monochromated Al Kα X-ray source and optimised electron optics ensuring excellent chemical resolution.

Advantages of high spectral energy resolution include:

• Unambiguous identification of chemical shifts
• Guaranteed energy resolution on insulating and conducting samples.

Fast parallel imaging

The lateral distribution of elements or chemistry at the surface is measured by XPS imaging.  The AXIS Supra⁺ acquires fast, high spatial resolution parallel images.  Parallel image acquisition has the advantage that it is significantly faster and achieves higher spatial resolution than the more conventional rastered beam approach.  Parallel imaging may also be combined with stage movements to acquire a ‘stitched’ image, capable of generating images over several millimetres with spatial resolution of several microns.

Capabilities provided by parallel imaging include:

• Ultimate spatial resolution of 1 micron at the highest magnification.
• High energy resolution, chemical state imaging.
• Quantitative imaging – the unique spherical mirror analyser and delay-line detector can provide quantitative chemical state images.
• Spectromicroscopy – easy acquisition of spectra from image datasets providing a spectrum at each pixel.

Versatile ESCApe software for acquisition and processing

ESCApe has been developed to make User interaction with the spectrometer as simple as possible, integrating acquisition and processing to fully exploit automation of the hardware.   An example of this is the group array analysis capability within ESCApe.  This functionality allows the User to drag an area across a sample and define an array of analysis points, from which spectra are acquired.  Automated peak identification and quantification allows easy generation of a colour concentration map of identified elements over the sample surface.

Unrivalled instrument automation

The AXIS Supra⁺ has complete automation of sample handling which sets it apart from any other spectrometer.  Auto sample exchange at the end of an experiment  allows continuous operation.  Unprecedented levels of automation extend to routine maintenance aspects such as computer controlled bake-out and subsequent degassing of filaments.

Automation also includes the X-ray source and monochromator mirror so that calibration and switching between Al Kα and optional Ag Lα excitation sources is completely computer controlled. Furthermore, continued optimised performance is ensured by the motorised multi-position anode.

High throughput sample handling – typical work flow

To guarantee high sample throughput, up to 3 sample holders may be placed on the Flexi-lock sample magazine.  An optical image is acquired of each sample holder from which the sample analysis positions are identified during the automated ‘pump’ cycle.  An acquisition method is chosen defining all requirements for the data acquisition.  A method may define simple spectroscopy or more complex experiments such as sputter depth profiling or angle-resolved XPS.  Subsequent analysis from samples on different sample holders can be added to the analysis queue with the automated sample handling system exchanging the sample holder to progress through the analysis queue. 

Key attributes of AXIS Supra⁺ automated sample handling:

• Automated, unattended sample holder exchange.
• High throughput, rapid sample analysis
• Ideal for a multi-User environment
• Sample mounting area up to 7200 mm² (2400 mm² x3 sample holders) with maximum sample thickness 19 mm (when using dual height sample holder).

Adjusts Laser Beam, Adjusts Parameter Settings During Observation, and Performs Image Processing Automatically

Operating time when using standard samples and standard cantilever: about 5 minutes*
* For automatic observation with 1 μm square field of view and 256 × 256-pixel resolution. Operating times can vary depending on the operator.

Previous SPM systems required practice adjusting the light beam, adjusting parameter settings during observations, and processing image data, but the SPM-Nanoa automates those processes to help ensure stress-free operations.

Extensive Functionality

Capture Sharp Images with All Modes from Optical to SPM Microscopy

Targets can be searched by an optical microscope, and magnified observation is facilitated by SPM.
Other physical property information can be obtained with the same field-of-view as the surface shape image.

Sample: SiO₂ patterns on Si

Wide Variety of Observation Modes

Supports a wide variety of observation modes, from observing shapes to mapping physical properties based on force curve measurements.
That means physical properties can be evaluated with high resolution.

* Optional

Search for Targets Easily

Targets can be searched for easily in sharp optical microscope images without vibration effects.
The SPM-Nanoa combines a high-performance optical microscope and SPM unit in a single integrated system.

View Test Patterns

With the integrated optical microscope (left), the periodic structure of a 3 μm interval on the sample surface can be clearly observed.

Observe Localized Physical Properties with High Resolution

The deformation of extremely soft samples or differences in the mechanical or electrical properties of samples can be observed with high resolution, even if such characteristics are localized.

KPFM Mode Observation of Gold Nanoparticles on Mica Substrate

This shows a surface potential image (right) acquired with the same field-of-view as a 0.2 μm shape image (left).

8K Images Enable High-Resolution Observation of Large Areas

Detailed structures can be observed even in images of large areas. High-resolution observation is achieved with up to 8K (8192 × 8192) pixels.

Observation of Vapor-Deposited Metal Coating

Saves Time

Various Support Functionality Achieves Fast Observation

Observation times have been significantly shortened with faster observation and physical property-mapping processes.
Simple sample and cantilever replacement processes ensure the system can be prepared for observations quickly.

Three functions enable significantly shorter observation times.

High-Throughput Observation Fast Physical Property Mapping

Simple & Smooth Sample Replacement

Easy and Reliable Cantilever Replacement

High-Throughput Observation
Fast Physical Property Mapping

The data acquisition time required for observation and mapping physical properties has been significantly shortened by using a high-throughput scanner that achieves a fast response and by optimizing the control algorithm.

* Actual observation times will vary depending on parameter settings.

Simple & Smooth Sample Replacement

Samples can be placed and removed by opening/closing the stage with a single click. Because the system maintains the laser beam position, samples can be observed immediately after replacement.

Easy and Reliable Cantilever Replacement –Cantilever Master (Option)–

Cantilevers can be installed by simply placing the cantilever in the specified position and then sliding it along the guide. That ensures cantilevers can be replaced easily and reliably even by operators not used to using tweezers.

The new HR-SPM scanning probe microscope uses frequency detection.
his instrument is not only capable of ultra-high resolution observations in air or liquids, but for the first time enables observations of hydration/solvation layers at solid-liquid interfaces.

Existing SPMs (scanning probe microscopes) and AFMs (atomic force microscopes) generally use AM (amplitude modulation). In principle however, the FM (frequency modulation) measurement method enables higher imaging resolution.

High Resolution

• Uses the FM-AFM method
• Noise in air and liquids is reduced to 1/20th that of existing methods.
• Achieves the performance level of a vacuum-type SPM, even in air and liquids!

Improved Usability

• The installation of the HT scanner has expanded the observation area and increased speed.
• Dual monitors and signal capabilities greater flexibility

Atomic Resolution Observations in Solution

Observations were made of the arrangement of atoms on a NaCl surface in a saturated aqueous solution. Atoms hidden by noise in existing AFM observations (AM method, left) are clearly visible when the FM method (right) is used. The FM method provides true atomic resolution.

Pt Catalyst Particles Observation in Air​

Pt catalyst particles in a TiO₂ substrate were identified, and the surface potential was measured using a KPFM. Pt particles several nm in size were observed in the exchange of charges with the substrate. In the figure on the right, the red circles indicate positive potential, and the blue circles indicate negative potential. It is evident that the resolution has been dramatically improved, even for a KPFM.
 

Note: KPFM functionality is available on a special order basis.

Cited References

• Ryohei Kokawa, Masahiro Ohta, Akira Sasahara, Hiroshi Onishi, Kelvin Probe Force Microscopy Study of a Pt/TiO₂ Catalyst Model Placed in an Atmospheric Pressure of N₂ Environment, Chemistry – An Asian Journal, 7, 1251-1255 (2012).

Capabilities of the AXIS Supra

LARGE AREA, HIGH SENSITIVITY XPS

The AXIS Supra is first and foremost a high performance X-ray photoelectron spectrometer. Efficient collection of photoelectrons by the magnetic and electrostatic lenses combined with the high transmission 165 mm mean radius hemispherical analyser ensures that the AXIS Supra has unrivalled sensitivity and resolution.Spectra are collected in traditional scanned mode or fast, unscanned snap-shot mode where spectra may be acquired in less than a second using the delay-line detector (DLD).
Key attributes include:
• Easy detection of light elements.
• Excellent signal-to-noise, even at low concentrations.
• Fast data acquisition

SMALL SPOT, SELECTED AREA SPECTROSCOPY

Selected area spectroscopy is achieved by inserting a motorised aperture into the electrostatic lens column, forming a virtual probe at the sample surface. This approach means that selected area spectroscopy can be performed with either the monochromatic or achromatic dual anode X-ray source. Spectra are acquired from pre-defined analysis areas as small as 15 μm diameter from any position within the field of view of the lens. Key attributes include;
• Pre-defined small spot analysis areas.
• Optimised x-ray illumination for selected area performance.
• Click and analyse multipoint spectroscopy without sample movement.

HIGH ENERGY RESOLUTION

The primary application of the AXIS Supra is as a photoelectron spectrometer for chemical statecharacterisation of the surface. The 500 mm Rowland circle monochromated Al Ka X-ray source and optimised electron optics contribute to the excellent energy resolution performance.
• Unambiguous identification of chemical shifts.
• Guaranteed energy resolution on insulating and conducting samples.

FAST PARALLEL IMAGING

Parallel imaging, where an image of the sample surface is projected via the unique spherical mirror analyser (SMA) onto the 2D delay-line detector, allows the lateral distribution on surface chemistry to be investigated. Fast parallel imaging produces images with higher spatial resolution than the more traditional mapping approach.
• Ultimate spatial resolution of 1 μm at the highest magnification.
• Simple mouse click on image to define area of interest for selected area spectroscopy.
• Stitched imaging – combining parallel images with stage movements allows high spatial resolution images to be acquired over areas of several millimetres.
• Quantitative imaging – the unique SMA operates in fixed analyser transmission which ensures that energy resolution is constant as a function of kinetic energy allowing quantitative chemical state imaging.
• Spectromicroscopy – easy acquisition of spectra from images where a series of images are acquired over a defined energy range to produce a spectrum at each pixel.

UNRIVALLED INSTRUMENT AUTOMATION

Complete automation sets the AXIS Supra apart from any other X-ray photoelectron spectrometer currently available. Unattended sample transfer and exchange during analysis is realised through coordination of the Flexi-lock sample magazine and autostage in the sample analysis chamber. Auto exchange of sample holders during analysis ensures extremely high sample throughput removing the rate-limiting step previously associated with sample loading. Motorisation of both X-ray source and X-ray mirror automates calibration. Switching between monochromated Al Ka and the optional Ag La excitation sources is under full computer control. Where gas introduction to the vacuum system is required such as ion etching or UPS, gas handling and pressure regulation is fully automated. Automation extends to data interpretation with auto-peak ID integrated into the ESCApe processing software.
• Automated sample introduction and exchange.
• Computer controlled X-ray source and mirror.
• Automated gas introduction and pressure regulation for ion sources and UV lamp.

State-of-the-art performance

Designed for ease of use, the AXIS Nova has automated sample loading, orthogonal cameras for easy sample positioning and intuitive data acquisition software. A unique design of the AXIS Nova is the 110mm diameter sample platen allowing unrivalled large sample handling and high sample throughput. None of these attributes compromise the market-leading performance. The AXIS Nova is capable of high sensitivity, excellent energy resolution and fast, high spatial resolution imaging. It is ready to meet the analysis needs of the most challenging applications.

Sensitivity

The AXIS Nova is designed for the very best performance at large analysis area with efficient collection of photoelectrons contributing to high sensitivity in both spectroscopy and XPS imaging modes. High sensitivity ensures spectra can be acquired with excellent signal-to-noise in short acquisition times. This is particularly important for materials that may be damaged by X-ray exposure. It also means that the AXIS Nova is capable of easily detecting low concentration species as well as light, conventionally hard to detect elements.

• Ability to detect, measure and quantify lowest concentrations with ease.
• Short acquisition times for spectroscopy and imaging modes.

Resolution

The very best resolution in spectroscopic and imaging mode is another fundamentally important property of any spectrometer. Excellent spectroscopic energy resolution of the AXIS Nova allows accurate and reproducible measurement of small chemical shifts used to determine surface chemistry.
Lateral, spatial resolution is important to be able to identify and image small surface features. Ultimate 1um image resolution is guaranteed using Kratos’ patented spherical mirror analyser (SMA).

• Large, 500 mm Rowland circle, X-ray monochromator designed for high energy resolution XPS.
• Outstanding spectroscopic resolution guaranteed on conducting and insulating samples.

Simplicity

The AXIS Nova uses ESCApe which is the common acquisition, processing and reporting software across all Kratos photoelectron spectrometers. ESCApe software is the Users’ interface with this high-performance instrument, making interaction with the spectrometer as simple as possible. It includes integration of acquisition and automated processing to exploit automation provided by the hardware. Ease of use is ensured by a simple acquisition work-flow. Following identification of the analysis position from the optical microscopes, predefined acquisition methods are selected to start sample analysis. These methods can be as simple as a survey spectrum or more complex such as sputter depth profiling with compucentric rotation during etching. ESCApe retains flexibility for expert Users to define their own acquisition methods.

• Pre-defined ‘walk-up and use’ acquisition methods.
• Complete computer control of AXIS Nova spectrometer making acquisition easier for novice Users.
• Integrated acquisition, data processing and interpretation software.

Parallel XPS imaging

The distribution of elements or chemistry across the surface is measured by XPS imaging. The AXIS Nova acquires fast, high spatial resolution parallel images. Parallel image acquisition has the advantage that it is significantly faster and achieves higher spatial resolution than the more conventional rastered beam approach. Parallel imaging may also be combined with stage movements to acquire a ‘stitched’ image, capable of generating images over several millimetres with spatial resolution of several microns.

Capabilities provided by parallel imaging include:

• 3 microns ultimate spatial resolution at the highest imaging magnification.
• High energy resolution, chemical state imaging.
• Quantitative imaging – the unique spherical mirror analyser and delay-line detector provide quantitative chemical state images.
• Spectromicroscopy – acquisition of spectra from image datasets providing a spectrum at each pixel.

Automation

Automation of the AXIS Nova ensures ease of use of the spectrometer. Automated multi-platen exchange allows transfer between the sample storage elevator in the sample entry chamber (SEC) and sample analysis chamber (SAC) without User intervention. The AXIS Nova can accommodate up to three, 110 mm diameter sample platens in the instrument at a time, ensuring high sample throughput analysis. Large view ports in both the SEC and SAC mean that the platen can always be observed for complete piece of mind. Seamless automation also means that the instrument can be operated remotely for data acquisition as well as applications and service support.

Gas handling for Argon ion sputter sources or the optional UV lamp for ultra-violet photoemission spectroscopy (UPS) is also fully automated.

Additional Capabilities

Whilst the AXIS Nova is primarily designed for high throughput, high performance XPS, additional analytical capabilities can be added without compromising the performance. An ultraviolet He-discharge lamp can be added to allow collection of ultraviolet photoemission spectra (UPS) for valence band and work function measurements.

Ion scattering spectroscopy (ISS) can be configured as an additional technique for elemental characterisation of the outermost surface of the sample. Both the Minibeam 4 and Minibeam 6 ion sources can be configured for use with low energy He⁺ ions and the analyser polarity reversed to achieve this acquisition mode simply through the ESCApe User interface.

Coincident analytical techniques available on the XPS analysis chamber include:

• Ultraviolet photoemission spectroscopy (UPS)
• Ion scattering spectroscopy (ISS)

Surface modification capabilities include:

• Air sensitive sample handling; glove box, inert sample transporter & modified sample platens

This instrument is equipped with a cutting-edge FE electron optical system, which provides unprecedented spatial resolution under all beam current conditions, from SEM observation conditions up to 1 μA order. Integration with high performance X-ray spectrometers that Shimadzu has fostered through the company’s traditions achieves the ultimate advance in analysis performance.

Unprecedented Spatial Resolution

The system offers the ultimate in secondary-electron image resolution under the beam current conditions used for analysis. (With a 10 kV accelerating voltage, 20 nm at 10 nA / 50 nm at 100 nA / 150 nm at 1 μA). The results are very clear in comparison to a conventional electron gun (CeB6, tungsten).
The same resolution image can be obtained with a dramatically larger beam current than with a conventional electron gun, so extremely high sensitivity X-ray analysis can be performed.
A further point of interest is SEM imaging with a 1 μA beam current. Only the EPMA-8050G provides a beam current of at least 1 μA, and moreover, finely focuses the beam to this point.

Comparison of Electron Gun Beam Characteristics (10 kV accelerating voltage)

Highest Secondary-Electron Image Resolution of 3 nm
This is a sample observation of gold particle deposition on carbon. A maximum resolution of 3 nm (at 30 kV) is achieved. The beam is focused even at a comparatively large beam current, so a smooth, high-resolution SEM image is easily obtained.

Large Beam Current Enabling Ultra High Sensitivity Analysis

In SEM and EPMA with the FE type, this system’s uniquely large beam current (up to 3 μA with a 30 kV accelerating voltage) dramatically enhances the detection sensitivity for ultra trace elements. This enables ultra trace component imaging in element mapping.
In addition, there is no need to replace the objective aperture across the entire beam current range, so the analysis process can be fully automated, with no concerns about axis offset.
These three images show the results* of a mapping analysis of approx. 1 % Si in stainless steel, using different beam currents. The roughness decreases as the beam current increases, enabling the areas containing Si to be precisely identified.

* In all the measurements, the accelerating voltage was 10 kV, and the sampling interval was 50 msec.
The measurements required approx. 1 hour.

Up to Five High Performance 4-Inch X-Ray Spectrometers Can be Mounted

Maintains the 52.5° X-ray take-off angle that is fundamental to analytical performance.

High sensitivity caused by low X-ray absorption

A high X-ray take-off angle also reduces the absorption effect when the bottom of a deep hole or the foreign matter in a hole is analyzed for examples.

Analysis data for foreign matter in a pit. Bottom-left is the distribution of iron (Fe); bottom-right is the distribution of titanium (Ti). The high take-off angle used by the EPMA-8050G ensures highly accurate analysis of rough samples.

Johanson-type analyzing crystal achieves perfect convergence.

Shimadzu applied its unique crystal manufacturing expertise fostered through the company’s long traditions to offer analyzing crystals that deliver both high sensitivity and high resolution. The Johanson-type analyzing crystal achieves perfect convergence with no aberration.

EPMA-8050G accommodates up to five 4-inch spectrometers that offer both high sensitivity and high resolution.

The Rowland circle radius in the X-ray spectrometer is an important factor affecting the EPMA analytical performance. Increasing the radius of the Rowland circle by one inch reduces the detection sensitivity by more than 30%. Shimadzu EPMA instruments accommodate up to five 4-inch spectrometers to cover the entire spectral range.

Simple and Easy-to-Understand Operations for All Analyses

This system is equipped with a number of new functions to enable simple and easy-to-understand operations. These include advanced operational performance, with all operations controlled using just a mouse, as well as a user interface designed to be easy to understand, and a built-in easy mode analysis. While easy enough for even novices to use, it also supports sophisticated analysis by experienced users.

• Easy operations for everything from sample mounting to report generation
• Even novices can easily perform everything from sample searching to SEM imaging.
• Unprecedented operability dramatically heightens operational efficiency prior to the start of the analysis.
• Visually, the user interface is designed to be easy to understand.
• Equipped with an easy mode analysis that automates all processes up to generating reports.

Advanced Technology Enabling Ultra High Sensitivity Analyses of Minute Areas

1. High-Brightness Schottky Emitter

A high output Schottky emitter with a larger tip diameter than ordinarily used in SEMs is adopted for the FE electron gun. A stable electron beam is obtained that while bright has the large current indispensable for high sensitivity analysis.

2. Special EPMA Electron Optical System

The electron optical system has a proprietary configuration and control method (Japan Patent No. 4595778). The condenser lens is set as close as possible to the electron gun. Crossover is formed not with the condenser lens but with an iris lens, with the objective aperture arranged at the same position. While this is a simple lens configuration, a large current can be obtained. At the same time, the angular aperture can be optimally configured under all current conditions, minimizing the electron beam diameter. Naturally, there is no need to replace the objective aperture.

3. Ultra High Vacuum Evacuation System

A two-stage differential evacuation system has been adopted, partitioned at the orifices between the electron gun chamber, intermediate chamber, and analysis chamber. Minimizing the orifice between the intermediate chamber and analysis chamber limits the flow of gas to the intermediate chamber. The electron gun chamber is always maintained at an ultra high vacuum level, stabilizing emitter operation.

4. X-Ray Spectrometers with High Sensitivity

The system can be equipped with up to five 4-inch X-ray spectrometers which provide both high sensitivity and high resolution.
The 52.5° X-ray take-off angle enhances the spatial resolution of the X-ray signal, while enabling high sensitivity analysis with minimal X-ray absorption by the sample.

Both hardware and software incorporate the latest technologies to create the next generation of EPMA. New functions that offer simple and easy-to-understand operation have been added to the superb basic EPMA performance that Shimadzu has fostered over many years – high sensitivity, high accuracy, and high resolution – to allow the EPMA’s capabilities to be exploited to the fullest. While easy enough for even novices to use, it also supports sophisticated analysis by experienced users.

Optimum X-Ray Spectrometer Design Offers Highly Sensitive and Accurate Analysis

Maintains the 52.5° X-ray take-off angle that is fundamental to analytical performance.

Johanson-type analyzing crystal achieves perfect convergence.

Shimadzu applied its unique crystal manufacturing expertise fostered through the company’s long traditions to offer analyzing crystals that deliver both high sensitivity and high resolution. The Johanson-type analyzing crystal achieves perfect convergence with no aberration.

EPMA-1720 accommodates up to five 4-inch spectrometers that offer both high sensitivity and high resolution.

The Rowland circle radius in the X-ray spectrometer is an important factor affecting the EPMA analytical performance. Increasing the radius of the Rowland circle by one inch reduces the detection sensitivity by more than 30%. Shimadzu EPMA instruments accommodate up to five 4-inch spectrometers to cover the entire spectral range.

Unprecedented Easy Operation Boosts Work Efficiency from SEM Observation to Analysis

The optical microscope image appears on the same monitor as the SEM image. The sensitivity is extremely high.

Start SEM imaging with a single click.

Just click the [Auto SEM] button to start SEM imaging using the preset conditions.

Simple, quick, and accurate adjustment of the beam current, while maintaining focus

Simply designate the target beam current for quick and accurate automatic setting. Interlocking control ensures that focus is maintained when the beam current is changed.

Simple and Easy-to-Understand Operations for All Analyses

This system is equipped with a number of new functions to enable simple and easy-to-understand operations. These include advanced operational performance, with all operations controlled using just a mouse, as well as a user interface designed to be easy to understand, and a built-in easy mode analysis. While easy enough for even novices to use, it also supports sophisticated analysis by experienced users.

• Easy operations for everything from sample mounting to report generation
• Even novices can easily perform everything from sample searching to SEM imaging.
• Unprecedented operability dramatically heightens operational efficiency prior to the start of the analysis.
• Visually, the user interface is designed to be easy to understand.
• Equipped with an easy mode analysis that automates all processes up to generating reports.

High-Throughput Scanner Shortens Observation Times

Due to the new deveopled HT scanner that achieves a high-speed response and optimizing softwares and the design of control system, aquisition of the image data is now available at a speed of conventional than 5 times or more(our ratio). The scanner can easily be replaced so existing scanners can be used. The HT scanner can also be added to an existing SPM-9700 unit to enable high-throughput observation.

Analysis Example
Surface Roughness Analysis of a Vapor-Deposited Metal Film

The surface topology of a vapor-deposited metal film was observed using a scanning rate of 1 Hz and 5 Hz.
Image quality and surface roughness analysis results are equivalent.

Grating Surface Topology Measurement

The grating surface topology was observed at a scanning rate of 1 Hz and 5 Hz. The measurement by cross-section profile analysis shows that both give the same results.

High Stability & High Throughput

With the optical lever system and cantilever integrated in the head, samples can be replaced by simply sliding the head. Since samples can be changed without shutting off the laser beam, laser irradiation characteristics remain highly stable even after changing the sample. This eliminates the need to readjust the optical axis or other parameters associated with stopping the laser, which means analysis times can be shortened.

High Stability

• The laser remains stable and irradiating the cantilever even while replacing samples.
• Design is resistant to vibration, noise, wind, and other external disturbances, so a specialized enclosure is not necessary.
• The main unit includes a built-in vibration isolator.

Secret to the High Throughput of the SPM-9700HT

Remarkable Mechanism Optimized for Ease of Operation

－Comparison of Throughput for Differences in Replacing Samples－

Cantilever Mounting Jig

This jig ensures easy and secure mounting of the cantilever.

1. Mount the cantilever holder on the mounting jig and fix the holder using the holder fixing knob.
   Then, press the presser bar release pin.
   (The cantilever presser bar lifts up.)

1. Place the cantilever on the slide.
   Pause a moment at this stage!
   You can release and pinch the cantilever again in this step!

1. Move the cantilever from the slide to the holder.
   ( The cantilever is set properly! )

1. Press the presser bar setting lever slowly.
   The presser bar release pin will return and the cantilever will be fixed.

Applicable Cantilever Holders
Standard holders for AFM, holders for electric current, holders for minute electric current, and holders for KFM

1. This jig cannot be used for cantilever holders for solution cells.

Product Configuration
1) Mounting jig main unit 1
2) Hexagon wrench for adjustment 4
3) Holding case 1
4) Instruction manual 1
* Patent pending

Wide Variety of 3D Rendering Functions Using Mouse Operations

Images can be freely rotated, zoomed, and Z-axis magnification varied using the mouse to intuitively adjust the viewing angle or magnification level. Using sophisticated analytical tools, such as a texture function, which displays sample physical properties overlaid with height information, or a 3D cross-section profile analysis function, dramatically improves the efficiency of image verification work.

Zoom

Rotation

Change Z-Axis Magnification

Texture Function

Height information can be displayed overlaid with information about other physical properties. This allows clearly showing the relationship between both parameters.

3D Cross-Section Profile Analysis

Cross-section profiles can be analyzed in 3D images. If physical property information is expressed in terms of texture, respective cross-section profiles can be displayed and analyzed in the same location.

Nano 3D Mapping

Nanophysics Evaluation System

Visualizing the Physical Properties of Nano-Regions on Surface or Interface

The physical properties of external or boundary surfaces can be evaluated by measuring the force acting on a
scanning probe microscope cantilever probe as its distance from the sample is varied (force curve measurement).

1. The adhesive force and Young’s modulus can be evaluated at a specific target location by measuring the force curve at that point (point analysis).
2. By acquiring force curves at multiple points, a two-dimension map of the physical properties can be created (mapping analysis).
3. Acquired data can be displayed three-dimensionally, or specific data can be extracted for data analysis (3D analysis).

Evaluating Physical Properties at Any Point on a Film

Force curves were measured at arbitrary points on a film surface. The results show that the adhesive force is different at the respective points.
Similarly, physical properties can also be evaluated on small soft samples, such as biopolymers.

3D Analysis

All force curves acquired for mapping are saved.
Therefore, the data can be displayed three-dimensionally, or specific cross sections can be extracted for data analysis.

Mapping the Physical Properties of Plastic Films

Mapping analysis can be used to measure adhesive force and Young’s modulus as well as surface topography. The figure shows a quantitative visualization of the Young’s modulus within a localized area only 300 nm wide on a plastic film surface. (Sample source: MORESCO).


Application example: Evaluating the uniformity of a polymer material surface

Adhesive Part of an Adhesive Tape

These images are from an evaluation of the adhesive part of an adhesive tape. They show that the adhesive force is distributed non-uniformly. This demonstrates how the system can be used to evaluate adhesive properties, which were difficult to evaluate using conventional methods.

Main Specifications

Force Curve

Mapping

SPM-9700 Scanning Probe Microscope

Ease of Operation Minimizes Distraction from Observation to Analysis

A guidance function to guide users through procedures, a navigation function that eliminates uncertainty about the observation position, and other features help ensure observations can be performed quickly and smoothly.

A revolutionary layout-free user interface (GUI) is used that provides borderless support for operations ranging from online observation to offline analysis. This means the SPM can be operated from observation to determining observation position and obtaining observation results without confusion.Operate Without Confusion

From startup to observation and analysis, the SPM can be operated using only mouse-clicks, without requiring any complicated settings

(1) Startup

Select the observation mode in the [Manager] window.

(2) Setup

Follow the steps indicated in the guidance window to easily complete setup.

(3) Start Observation

Clicking the [Observation Start] button performs all operations automatically, from approach to observation.

(4) Display

Image data obtained in the past can be viewed without switching offline.

(5) Offline Analysis

A wide selection of functions for displaying, processing, and analyzing images are available for expressing observation results more attractively and quantitatively.

Determine the Observation Position Without Confusion

(1) Observation Window

Up to 8 images can be displayed simultaneously. This means the surface shape and physical properties can be compared in multiple images, while scanning.

(2) Navigator

The Navigator clearly shows what area is being observed. Since previously observed images can be displayed, this enables obtaining an overall view of the entire sample.

Obtain Observation Results Without Confusion

(3) Online Profile

Cross-section profiles can be measured in the online window while observing samples.

(4) Image History

Past image data can be displayed next to current observation images for comparison.

Wide Assortment of Scanning Functions

(5) Force Mapping

A force curve can be measured for each point in observed image data to acquire a distribution of sample mechanical properties or adhesion force (special order).

(6) Vector Scanning

The scanning direction, force between the probe and sample, or the applied voltage can be programmed to allow scanning according to a program (special order).

Functionality and Expandability to Meet a Wide Range of Requirements

A generous selection of measurement modes and excellent expandability helps ensure reliable measurements, regardless of the properties that a wide variety of samples may have, such as hardness or electrical conductivity.

With a generous selection of measurement modes, images can be obtained that show other information besides the sample shape, such as electrical current or electrical potential levels, or surface hardness or viscosity properties.

Standard specification

Contact Mode

Dynamic Mode

Phase Mode

Lateral Force Mode (LFM)

Standard specification

Force Modulation Mode

Optional Functions

Nano 3D Mapping

Current Mode

Surface Potential Mode (KFM)

Optional Functions

Magnetic Force Mode (MFM)

Vector Scanning (special order)

Petri Dish Type Solution Cell (special order)

Electrochemical Solution Cell